Radiative Heater
High temperature and better heating homogeneity; Continual rotating pssibility, suitable for large scale wafer.
Compatibe with Pulsed Laser Deposition System, Sputtering System, E-beam Evaporation System, etc.
Radiative Heater
High temperature and better heating homogeneity; Continual rotating pssibility, suitable for large scale wafer.
Compatibe with Pulsed Laser Deposition System, Sputtering System, E-beam Evaporation System, etc.
Heating temperature: up to 1000擄C
Wafer size: up to 8 inch
Heating stability: 鹵1擄C
Ramp rate: 10擄C/min
